New Angle Etching Technique for Making Quantum Devices

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Details of a microns-thick photonic device. UC Davis engineers have developed a new technique for creating quantum devices called color centers in silicon carbide, potentially opening up new ways to manufacture such devices at scale. (Courtesy of Sridhar Majety)

Researchers at the University of California, Davis, have demonstrated an angle etching method for fabricating quantum photonic devices at the wafer scale in silicon carbide. 

Color centers are the essential hub for photons (particles of light) in quantum devices. They are the components that emit and maintain photons, functioning as a quantum memory bank. However, they are challenging to fabricate, particularly for the industrial development of quantum technology. 

Associate Professor of Electrical and Computer Engineering Marina Radulaski and graduate student Sridhar Majety adapted a technique originally developed by Harvard University researchers to etch quantum devices in diamond to work with silicon carbide, a cheaper material that is widely available for electronics manufacturing. 

This development, published in the journal Nanophotonics, brings within reach the reality of producing hardware like quantum nanodevices at scale and, thus, the development of the quantum internet.

Read more about their work here

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